ASD Area Selective Deposition Imaging with PiFM

PiFM works well with both organic and inorganic materials. In ASD, organic self-assembled monolayers (SAMs) act as masks to promote or inhibit the atomic layer deposition in selected regions.

In the example below, a SAM selectively covers the metal region and allows alumina to be deposited preferentially on the exposed oxide region. SiO2, SAM, and Al2O3 regions are imaged at 1103, 1471, and 972 cm^-1 respectively.  Silicon oxide displays well-defined, high contrast. The SAM and alumina are not as localized, though contrast can still be seen between areas of lower and higher concentration.