Latent Images of Exposed EUV Photoresist
The development of EUV (extreme ultraviolet) resist materials is critical to producing semiconductor devices with the smallest feature sizes. Understanding the light-induced chemistry of EUV photoresist and its impact on the quality of EUV lithography would help engineers to optimize this important technology. Photo-induced Force Microscopy (PiFM), with its capability to detect nanoscale chemical properties, is well suited […] Read more