January 2018

exposed EUV PiFM imaging

Latent Images of Exposed EUV Photoresist

The development of EUV (extreme ultraviolet) resist materials is critical to producing semiconductor devices with the smallest feature sizes. Understanding the light-induced chemistry of EUV photoresist and its impact on the quality of EUV lithography would help engineers to optimize this important technology. Photo-induced Force Microscopy (PiFM), with its capability to detect nanoscale chemical properties, is well suited […] Read more

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